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Effect of back-gate on contact resistance and on channel conductance in graphene-based field-effect transistors

机译:背栅对接触电阻和沟道电导的影响   基于石墨烯的场效应晶体管

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摘要

We study the contact resistance and the transfer characteristics ofback-gated field effect transistors of mono- and bi-layer graphene. We measurespecific contact resistivity of ~7kohm*um2 and ~30kohm*um2 for Ni and Ti,respectively. We show that the contact resistance is a significant contributorto the total source-to-drain resistance and it is modulated by the back-gatevoltage. We measure transfer characteristics showing double dip feature that weexplain as the effect of doping due to charge transfer from the contactscausing minimum density of states for graphene under the contacts and in thechannel at different gate voltage.
机译:我们研究了单层和双层石墨烯的背栅场效应晶体管的接触电阻和传输特性。我们分别测量了Ni和Ti的〜7kohm * um2和〜30kohm * um2的比接触电阻率。我们表明,接触电阻是总源极至漏极电阻的重要贡献,并且受背栅电压的影响。我们测量显示出双倾特征的传输特性,我们将其解释为由于来自接触的电荷转移而引起的掺杂效应,从而导致在不同栅极电压下在接触下和沟道中石墨烯的状态密度最小。

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